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Electrically pumped continuous-wave III–V quantum dot lasers on silicon
Siming Chen,Wei Li,Jiang Wu,Qi Jiang,Mingchu Tang,Samuel Shutts,Stella N. Elliott,Angela Sobiesierski,Alwyn J. Seeds,Ian Ross,Peter M. Smowton& Huiyun Liu
AffiliationsContributionsCorresponding authors
Nature Photonics (2016) doi:10.1038/nphoton.2016.21
Received 08 November 2015 Accepted 25 January 2016 Published online 07 March 2016
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Reliable, efficient electrically pumped silicon-based lasers would enable full integration of photonic and electronic circuits, but have previously only been realized by wafer bonding. Here, we demonstrate continuous-wave InAs/GaAs quantum dot lasers directly grown on silicon substrates with a low threshold current density of 62.5 A cm–2, a room-temperature output power exceeding 105 mW and operation up to 120 °C. Over 3,100 h of continuous-wave operating data have been collected, giving an extrapolated mean time to failure of over 100,158 h. The realization of high-performance quantum dot lasers on silicon is due to the achievement of a low density of threading dislocations on the order of 105 cm−2 in the III–V epilayers by combining a nucleation layer and dislocation filter layers with in situ thermal annealing. These results are a major advance towards reliable and cost-effective silicon-based photonic–electronic integration.
